10/15/2026
Curvilinear mask shapes are rapidly moving into production at advanced nodes, creating new challenges for correction, verification, and mask rule checking (MRC) workflows.
Join Silvaco's upcoming webinar, "Full-Chip Curvilinear Patterning: From Design-Stage Exploration to Process-Variation Analysis," on November 5, 2026, and discover how our production PPC suite delivers a connected workflow, from interactive lithography exploration and full-chip curvilinear correction to process-variation analysis with the Silvaco FTCO™ intelligence solution platform.
What You Will Learn
How full-chip curvilinear correction, verification, and MRC are handled natively on curved contours
How PPC integration with Virtuoso enables interactive lithography exploration during layout creation
How Victory DoE connects PPC into FTCO workflows for systematic process-variation studies
When: November 5, 2026
Where: Online
Time: 10:00am Santa Clara (PDT)
Time: 11:00am Paris
Time: 10:00am Beijing
🎤 Attending the Santa Clara session? Stay for the live Q&A and get your questions answered directly by Silvaco experts.
Register today and learn how advanced patterning workflows can reduce iterations between design intent and manufacturable mask data.
To register please visit our website at silvaco.com and go to resources>webinars